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  • The application of the Kelvin probe in materials science. 

    Lagel, Bert (The Robert Gordon University School of Pharmacy and Life Sciences, 2000-08)
    LAGEL, B., BAIKIE, I. and PETERMANN, U., 1998. A novel detection system for defects and chemicals contamination in semiconductors based upon the scanning Kelvin probe. In: S. ASHOK, J. CHEVALLIER, K. SUMINO, B. SOPORI and GOETZ, W., eds. Defect and impurity engineered semiconductors and devices II, Materials Research Society Proceedings 510, pp. 619-625
     
    BAIKIE, I., PETERMAN, U. and B. LAGEL, 1999. UHV compatible spectroscopic scanning Kelvin probe for surface analysis. Surface Science, 433, p. 249.
     
    LAGEL, B., BAIKIE, I. and PETERMANN, U., 1999. A novel detection system for defects and chemicals contamination in semiconductors based upon the scanning Kelvin probe. Surface Science, 433, p. 622.
     
    BAIKIE, I., PETERMANN, U. and LAGEL, B., 1999. In situ work function study of oxidation and thin film growth on clean surfaces. Surface Science, 433, p. 770.
     
    BAIKIE, I., PETERMANN, U., SPEAKMAN, A., LAGEL, B., DIRSCHERL, K. and ESTRUP, P., 2000. Work function study of Rhenium oxidation using a UHV scanning Kelvin probe. Journal of Applied Physics, 88 (1)
     
    PETERMANN, U., BAIKIE, I., LAGEL, B. and DIRSCHERL, K., 2000. Work function study of polycrystalline metals using a UHV scanning Kelvin probe. In: D. GINLEY, D. NEWNS, H. KAWAZOE, A. KOZYREV and J. PERKINS GOSSEN, eds. Materials science of novel oxide-based electronics. Materials Research Society Proceedings, 623, pp. G6.6.1-G6.6.6
     
    PETERMANN, U., BAIKIE, I., LAGEL, B. and DIRSCHERL, K., 2000. Work function study for the search of efficient target materials for use in hyperthermal surface ionisation using a scanning Kelvin probe. In: L. GIGNAC, O. THOMAS, J. MACLAREN and B. CLEMENS, eds. Polycrystalline metal and magnetic thin films. Materials Research Society Proceedings, 615, pp. 37-42.
     
    LAGEL, B., BAIKIE, I., DIRSCHERL, K. and PETERMANN, U., 2000. A novel method for true work function determination of metal surfaces by combined Kelvin probe and photoelectric effect measurements. In: YEADON, M., CHIANG, S., FARROW, R., EVANS, J. and AUCIELLO, O., eds. Recent developments in oxide and metal epitaxy - theory and experiment. Materials Research Society Proceedings, 619, pp. 73-78.
     
    LAGEL, B., BAIKIE, I., DIRSCHERL, K. and PETERMANN, U., 2000. A novel approach for true work function determination of electron-emissive materials by combined Kelvin probe and photoelectric effect measurements. In: JENSEN, K., MACKIE, W., TEMPLE, D., ITOH, J., NEMANICH, R., TROTTIER, T. and HOLLOWAY, P., eds. Electron-emissive materials, vacuum microelectronics and flat-panel displays. Materials Research Society Proceedings, 621, pp. R3.5.1-R3.5.7.
     
    PETERMANN, U., BAIKIE, I. and LAGEL, B., 1999. Kelvin probe study of metastable states during initial oxygen adsorption dynamics on Si(111) 7x7. Thin Solid Films, 343-344, p. 492.
     
    KIM, J., LAGEL, B., MOONS, E., JOHANSSON, N., BAIKIE, I., SALANECK, W., FRIEND, R. and CACIALLI, F., 2000. Kelvin probe and ultraviolet photoemission measurements of Indium Tin Oxide work function: a comparison. Synthetic Metals, 111-112, p. 311.
     
    This thesis reports on the application of the Kelvin probe in materials science and in particular on the study of metal and semiconductor surfaces in both ambient and UHV environments. The concept of the work function φ ...